Jisung Park receives APL Materials Excellence in Research Award

Jisung ParkJisung Park

ASCENT Postdoc, Jisung Park (Cornell University, working with Darrell Schlom) was awarded a 2nd place prize (of $2,500 and waived page charges on his next publication) for his paper, "Fully transparent field-effect transistor with high drain current and on-off ratio." Winning papers are selected by an external committee based on their scientific content. The award will be announced during the MRS Fall '21 meeting. Papers will also be highlighted on the APL Materials webpage and included in AIP Publishing email communications to materials science researchers. Great job, Jisung!

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