ASCENT Theme 1(B) Liaison Meeting / Selective ALD


Location: webex


Chuck Winter (Wayne State) “Novel Low Valent and Radical Ligand Precursors for Atomic Layer Deposition of Co, Ti, and Ta”. 

Steven George (Colorado) "Hollow Cathode Plasma Electron Source (HCPES) Development for EE-ALD"

KJ Cho (UT Dallas) "TDDFT for Electron-Enhanced ALD".

Adam Hock (Illinois Tech) “Recent Progress in ALD Precursors for Gallium Oxides”

Andrew Kummel (UCSD) “High Selective ALD of Metals and Silicide With and Without Passivants”


This meeting is only available to the JUMP research community, such as Principal Investigators, Postdoc researchers, Students, and Industry/Government liaisons.