ASCENT Theme 1(B) Liaison Meeting / Selective ALD
Time: 3:00 pm - 4:30 pm
Location: Webex
Agenda
KJ Cho – DFT modeling of Ru ALD and n vs p type semiconductor oxides
Chuck Winter – Novel Co and Ti precursors and oxygen scavenging agents for bottom up fill and low resistance barriers.
Steve George – EEALD a new approach for bottom up fill and monolayer seed layers
Andy Kummel – Comparison for two Ru precursors for high nucleation density Ru ALD and ALA of heater spreaders
Adam Hock – New precursors for n and p semiconductor oxides and a novel precursor strategy for TMD
This meeting is only available to the JUMP research community, such as Principal Investigators, Postdoc researchers, Students, and Industry/Government liaisons.