ASCENT Theme 1(B) Liaison Meeting / Selective ALD


Location: webex

Time: 3:00 pm - 4:30 pm

Location: Webex



KJ Cho – DFT modeling of Ru ALD and n vs p type semiconductor oxides

Chuck Winter – Novel Co  and Ti precursors and oxygen scavenging agents for bottom up fill and low resistance barriers.

Steve George – EEALD a new approach for bottom up fill and monolayer seed layers

Andy Kummel – Comparison for two Ru precursors for high nucleation density Ru ALD and ALA of heater spreaders

Adam Hock – New precursors for n and p semiconductor oxides and a novel precursor strategy for TMD


This meeting is only available to the JUMP research community, such as Principal Investigators, Postdoc researchers, Students, and Industry/Government liaisons.